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CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR DEPOSITED AND THERMALLY GROWN SILICON NITRIDE FILMSHABRAKEN FHPM; KUIPER AEJ; OOSTROM AV et al.1982; J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1982; VOL. 53; NO 1; PP. 404-415; BIBL. 40 REF.Article
